Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
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Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
Pampillon Arce, Maria Angela
Springer International Publishing AG
10/2017
164
Dura
Inglês
9783319666068
15 a 20 dias
This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets.
Introduction.- Fabrication Techniques.- Characterization Techniques.- Thermal Oxidation of Gd2o3.- Plasma Oxidation of Gd2o3 and Sc2o3.- Gadolinium Scandate.- Interface Scavenging.- Gd2o3 on Inp Substrates.- Conclusions and Future Work.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets.
Introduction.- Fabrication Techniques.- Characterization Techniques.- Thermal Oxidation of Gd2o3.- Plasma Oxidation of Gd2o3 and Sc2o3.- Gadolinium Scandate.- Interface Scavenging.- Gd2o3 on Inp Substrates.- Conclusions and Future Work.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
